Maskless, High-Precision, Persistent, and Extreme Wetting-Contrast Patterning in an Environmental Scanning Electron Microscope

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A maskless and programmable direct electron beam writing method is reported for making high-precision superhydrophilic-superhydrophobic wetting patterns with 152° contact angle contrast using an environmental scanning electron microscope (ESEM). The smallest linewidth achieved is below 1 μm. The reported effects of the electron beam induced local plasma may also influence a variety of microscopic wetting studies in ESEM.


Original languageEnglish
Pages (from-to)1847-1853
Number of pages7
Issue number14
Publication statusPublished - 13 Apr 2016
MoE publication typeA1 Journal article-refereed

ID: 2530335