Maskless, High-Precision, Persistent, and Extreme Wetting-Contrast Patterning in an Environmental Scanning Electron Microscope
Research output: Contribution to journal › Article › Scientific › peer-review
A maskless and programmable direct electron beam writing method is reported for making high-precision superhydrophilic-superhydrophobic wetting patterns with 152° contact angle contrast using an environmental scanning electron microscope (ESEM). The smallest linewidth achieved is below 1 μm. The reported effects of the electron beam induced local plasma may also influence a variety of microscopic wetting studies in ESEM.
|Number of pages||7|
|Publication status||Published - 13 Apr 2016|
|MoE publication type||A1 Journal article-refereed|