@article{8d780fff8cc54d0ab59a405ae6613bc3,
title = "Mask material effects in cryogenic deep reactive ion etching",
keywords = "alumina ALD, cryogenic, DRIE, etch mask, phoresist, alumina ALD, cryogenic, DRIE, etch mask, phoresist, alumina ALD, cryogenic, DRIE, etch mask, phoresist",
author = "Sami Franssila and Lauri Sainiemi",
year = "2007",
doi = "10.1116/1.2734157",
language = "English",
volume = "25",
pages = "801--807",
journal = "Journal of Vacuum Science and Technology. Part B.",
issn = "1071-1023",
publisher = "AVS Science and Technology Society",
number = "3",
}