Mask material effects in cryogenic deep reactive ion etching

Sami Franssila, Lauri Sainiemi

    Research output: Contribution to journalArticleScientificpeer-review

    52 Citations (Scopus)
    520 Downloads (Pure)
    Original languageEnglish
    Pages (from-to)801-807
    JournalJournal of Vacuum Science and Technology. Part B.
    Volume25
    Issue number3
    DOIs
    Publication statusPublished - 2007
    MoE publication typeA1 Journal article-refereed

    Keywords

    • alumina ALD
    • cryogenic
    • DRIE
    • etch mask
    • phoresist

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