Making porous conductive carbon films with unbalanced magnetron sputtering

Sung II Kim; Bibhuti Bhusan Sahu; Byung Mook Weon; Jeon Geon Han; Jari Koskinen; Sami Franssila

doi:10.7567/JJAP.54.010304

Making porous conductive carbon films with unbalanced magnetron sputtering

Sung II Kim
, Bibhuti Bhusan Sahu
, Byung Mook Weon
, Jeon Geon Han
, Jari Koskinen
, Sami Franssila

Department of Chemistry and Materials Science

Sungkyunkwan University

Research output: Contribution to journal › Article › Scientific › peer-review

13 Citations (Scopus)

Original language	English
Pages (from-to)	1-4
Number of pages	4
Journal	Japanese Journal of Applied Physics
Volume	54
Issue number	1
DOIs	https://doi.org/10.7567/JJAP.54.010304
Publication status	Published - 2015
MoE publication type	A1 Journal article-refereed

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 7 Affordable and Clean Energy

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@article{96721f64133c4c6d8dd23c1632ed967b,

title = "Making porous conductive carbon films with unbalanced magnetron sputtering",

author = "Kim, \{Sung II\} and Sahu, \{Bibhuti Bhusan\} and Weon, \{Byung Mook\} and Han, \{Jeon Geon\} and Jari Koskinen and Sami Franssila",

year = "2015",

doi = "10.7567/JJAP.54.010304",

language = "English",

volume = "54",

pages = "1--4",

journal = "Japanese Journal of Applied Physics",

issn = "0021-4922",

publisher = "Japan Society of Applied Physics",

number = "1",

}

TY - JOUR

T1 - Making porous conductive carbon films with unbalanced magnetron sputtering

AU - Kim, Sung II

AU - Sahu, Bibhuti Bhusan

AU - Weon, Byung Mook

AU - Han, Jeon Geon

AU - Koskinen, Jari

AU - Franssila, Sami

PY - 2015

Y1 - 2015

U2 - 10.7567/JJAP.54.010304

DO - 10.7567/JJAP.54.010304

M3 - Article

SN - 0021-4922

VL - 54

SP - 1

EP - 4

JO - Japanese Journal of Applied Physics

JF - Japanese Journal of Applied Physics

IS - 1

ER -

Making porous conductive carbon films with unbalanced magnetron sputtering

UN SDGs

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Equipment

OtaNano

Raw Materials Research Infrastructure

Cite this