Magnesium aluminate thin films by atomic layer deposition from organometallic precursors and water

Matti Putkonen; M. Nieminen; L. Niinistö

Magnesium aluminate thin films by atomic layer deposition from organometallic precursors and water

Matti Putkonen, M. Nieminen, L. Niinistö

Research output: Contribution to journal › Article › Scientific › peer-review

14 Citations (Scopus)

Original language	English
Pages (from-to)	103-107
Journal	Thin Solid Films
Volume	466
Publication status	Published - 2004
MoE publication type	A1 Journal article-refereed

Keywords

atomic layer deposition
magnesium aluminate
thin film

Cite this

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title = "Magnesium aluminate thin films by atomic layer deposition from organometallic precursors and water",

keywords = "atomic layer deposition, magnesium aluminate, thin film, atomic layer deposition, magnesium aluminate, thin film, atomic layer deposition, magnesium aluminate, thin film",

author = "Matti Putkonen and M. Nieminen and L. Niinist{\"o}",

year = "2004",

language = "English",

volume = "466",

pages = "103--107",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier Science",

}

TY - JOUR

T1 - Magnesium aluminate thin films by atomic layer deposition from organometallic precursors and water

AU - Putkonen, Matti

AU - Nieminen, M.

AU - Niinistö, L.

PY - 2004

Y1 - 2004

KW - atomic layer deposition

KW - magnesium aluminate

KW - thin film

KW - atomic layer deposition

KW - magnesium aluminate

KW - thin film

KW - atomic layer deposition

KW - magnesium aluminate

KW - thin film

UR - http://www.sciencedirect.com

M3 - Article

VL - 466

SP - 103

EP - 107

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

ER -

Magnesium aluminate thin films by atomic layer deposition from organometallic precursors and water

Keywords

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Cite this