| Original language | English |
|---|---|
| Pages (from-to) | 103-107 |
| Journal | Thin Solid Films |
| Volume | 466 |
| Publication status | Published - 2004 |
| MoE publication type | A1 Journal article-refereed |
Keywords
- atomic layer deposition
- magnesium aluminate
- thin film
Magnesium aluminate thin films by atomic layer deposition from organometallic precursors and water
Matti Putkonen, M. Nieminen, L. Niinistö
Research output: Contribution to journal › Article › Scientific › peer-review
15
Citations
(Scopus)