Low-temperature atomic layer deposition of SiO2/Al2O3 multilayer structures constructed on self-standing films of cellulose nanofibrils

Research output: Contribution to journalArticleScientificpeer-review

Standard

Low-temperature atomic layer deposition of SiO2/Al2O3 multilayer structures constructed on self-standing films of cellulose nanofibrils. / Putkonen, Matti; Sippola, Perttu; Svärd, Laura; Sajavaara, Timo; Vartiainen, Jari; Buchanan, Iain; Forsström, Ulla; Simell, Pekka; Tammelin, Tekla.

In: PHILOSOPHICAL TRANSACTIONS OF THE ROYAL SOCIETY A: MATHEMATICAL PHYSICAL AND ENGINEERING SCIENCES, Vol. 376, No. 2112, 20170037, 13.02.2018.

Research output: Contribution to journalArticleScientificpeer-review

Harvard

APA

Vancouver

Author

Putkonen, Matti ; Sippola, Perttu ; Svärd, Laura ; Sajavaara, Timo ; Vartiainen, Jari ; Buchanan, Iain ; Forsström, Ulla ; Simell, Pekka ; Tammelin, Tekla. / Low-temperature atomic layer deposition of SiO2/Al2O3 multilayer structures constructed on self-standing films of cellulose nanofibrils. In: PHILOSOPHICAL TRANSACTIONS OF THE ROYAL SOCIETY A: MATHEMATICAL PHYSICAL AND ENGINEERING SCIENCES. 2018 ; Vol. 376, No. 2112.

Bibtex - Download

@article{baf849eca47646988a17b15154a58cba,
title = "Low-temperature atomic layer deposition of SiO2/Al2O3 multilayer structures constructed on self-standing films of cellulose nanofibrils",
abstract = "In this paper, we have optimized a low-temperature atomic layer deposition (ALD) of SiO2 using AP-LTO{\circledR} 330 and ozone (O3) as precursors, and demonstrated its suitability to surface-modify temperature-sensitive bio-based films of cellulose nanofibrils (CNFs). The lowest temperature for the thermal ALD process was 80°C when the silicon precursor residence time was increased by the stop-flow mode. The SiO2 film deposition rate was dependent on the temperature varying within 1.5–2.2 {\AA} cycle−1 in the temperature range of 80–350°C, respectively. The low-temperature SiO2 process that resulted was combined with the conventional trimethyl aluminium + H2O process in order to prepare thin multilayer nanolaminates on self-standing CNF films. One to six stacks of SiO2/Al2O3 were deposited on the CNF films, with individual layer thicknesses of 3.7 nm and 2.6 nm, respectively, combined with a 5 nm protective SiO2 layer as the top layer. The performance of the multilayer hybrid nanolaminate structures was evaluated with respect to the oxygen and water vapour transmission rates. Six stacks of SiO2/Al2O with a total thickness of approximately 35 nm efficiently prevented oxygen and water molecules from interacting with the CNF film. The oxygen transmission rates analysed at 80{\%} RH decreased from the value for plain CNF film of 130 ml m−2 d−1 to 0.15 ml m−2 d−1, whereas the water transmission rates lowered from 630 ± 50 g m−2 d−1 down to 90 ± 40 g m−2 d−1.",
keywords = "low-temperature atomic layer deposition, SiO2, hybrid multilayers, cellulose nanofibrils, water sensitivity, diffusion barrier",
author = "Matti Putkonen and Perttu Sippola and Laura Sv{\"a}rd and Timo Sajavaara and Jari Vartiainen and Iain Buchanan and Ulla Forsstr{\"o}m and Pekka Simell and Tekla Tammelin",
year = "2018",
month = "2",
day = "13",
doi = "10.1098/rsta.2017.0037",
language = "English",
volume = "376",
journal = "PHILOSOPHICAL TRANSACTIONS OF THE ROYAL SOCIETY A: MATHEMATICAL PHYSICAL AND ENGINEERING SCIENCES",
issn = "1364-503X",
number = "2112",

}

RIS - Download

TY - JOUR

T1 - Low-temperature atomic layer deposition of SiO2/Al2O3 multilayer structures constructed on self-standing films of cellulose nanofibrils

AU - Putkonen, Matti

AU - Sippola, Perttu

AU - Svärd, Laura

AU - Sajavaara, Timo

AU - Vartiainen, Jari

AU - Buchanan, Iain

AU - Forsström, Ulla

AU - Simell, Pekka

AU - Tammelin, Tekla

PY - 2018/2/13

Y1 - 2018/2/13

N2 - In this paper, we have optimized a low-temperature atomic layer deposition (ALD) of SiO2 using AP-LTO® 330 and ozone (O3) as precursors, and demonstrated its suitability to surface-modify temperature-sensitive bio-based films of cellulose nanofibrils (CNFs). The lowest temperature for the thermal ALD process was 80°C when the silicon precursor residence time was increased by the stop-flow mode. The SiO2 film deposition rate was dependent on the temperature varying within 1.5–2.2 Å cycle−1 in the temperature range of 80–350°C, respectively. The low-temperature SiO2 process that resulted was combined with the conventional trimethyl aluminium + H2O process in order to prepare thin multilayer nanolaminates on self-standing CNF films. One to six stacks of SiO2/Al2O3 were deposited on the CNF films, with individual layer thicknesses of 3.7 nm and 2.6 nm, respectively, combined with a 5 nm protective SiO2 layer as the top layer. The performance of the multilayer hybrid nanolaminate structures was evaluated with respect to the oxygen and water vapour transmission rates. Six stacks of SiO2/Al2O with a total thickness of approximately 35 nm efficiently prevented oxygen and water molecules from interacting with the CNF film. The oxygen transmission rates analysed at 80% RH decreased from the value for plain CNF film of 130 ml m−2 d−1 to 0.15 ml m−2 d−1, whereas the water transmission rates lowered from 630 ± 50 g m−2 d−1 down to 90 ± 40 g m−2 d−1.

AB - In this paper, we have optimized a low-temperature atomic layer deposition (ALD) of SiO2 using AP-LTO® 330 and ozone (O3) as precursors, and demonstrated its suitability to surface-modify temperature-sensitive bio-based films of cellulose nanofibrils (CNFs). The lowest temperature for the thermal ALD process was 80°C when the silicon precursor residence time was increased by the stop-flow mode. The SiO2 film deposition rate was dependent on the temperature varying within 1.5–2.2 Å cycle−1 in the temperature range of 80–350°C, respectively. The low-temperature SiO2 process that resulted was combined with the conventional trimethyl aluminium + H2O process in order to prepare thin multilayer nanolaminates on self-standing CNF films. One to six stacks of SiO2/Al2O3 were deposited on the CNF films, with individual layer thicknesses of 3.7 nm and 2.6 nm, respectively, combined with a 5 nm protective SiO2 layer as the top layer. The performance of the multilayer hybrid nanolaminate structures was evaluated with respect to the oxygen and water vapour transmission rates. Six stacks of SiO2/Al2O with a total thickness of approximately 35 nm efficiently prevented oxygen and water molecules from interacting with the CNF film. The oxygen transmission rates analysed at 80% RH decreased from the value for plain CNF film of 130 ml m−2 d−1 to 0.15 ml m−2 d−1, whereas the water transmission rates lowered from 630 ± 50 g m−2 d−1 down to 90 ± 40 g m−2 d−1.

KW - low-temperature atomic layer deposition

KW - SiO2

KW - hybrid multilayers

KW - cellulose nanofibrils

KW - water sensitivity

KW - diffusion barrier

U2 - 10.1098/rsta.2017.0037

DO - 10.1098/rsta.2017.0037

M3 - Article

VL - 376

JO - PHILOSOPHICAL TRANSACTIONS OF THE ROYAL SOCIETY A: MATHEMATICAL PHYSICAL AND ENGINEERING SCIENCES

JF - PHILOSOPHICAL TRANSACTIONS OF THE ROYAL SOCIETY A: MATHEMATICAL PHYSICAL AND ENGINEERING SCIENCES

SN - 1364-503X

IS - 2112

M1 - 20170037

ER -

ID: 16819345