Earth and Planetary Sciences
Plasma
100%
Silicon Dioxide
100%
Atomic Layer Epitaxy
100%
Alumina
100%
Time
29%
Temperature
29%
Thin Films
29%
Quality
17%
Deposition
17%
Growth
17%
Cycle
17%
Moisture
17%
Growth Rate
17%
Utilization
11%
Parameter
11%
In Situ
11%
Thesis
5%
Impact
5%
Industry
5%
Show
5%
Investigation
5%
Interest
5%
Datum
5%
Increasing
5%
Rate
5%
Optimization
5%
Thickness
5%
Balance
5%
Oxygen
5%
Emerging
5%
Alternative
5%
Fabrication
5%
Impurity
5%
Tradeoff
5%
Roughness
5%
Oxidising Agent
5%
Reaction Kinetics
5%
Plasma Temperature
5%
Carbon Dioxide
5%
Refractivity
5%
Water Vapor
5%
Physics
Oxide
100%
Atomic Layer Epitaxy
100%
Silica
100%
Silicon Dioxide
100%
Temperature
29%
Thin Films
23%
Cycles
17%
Deposition
17%
Growth Rate
17%
Thin Film Growth
17%
Independent Variables
11%
Growth
11%
Degradation
11%
Work
5%
Impact
5%
Encapsulation
5%
Impurities
5%
Increasing
5%
Oxygen
5%
Roughness
5%
Optimization
5%
Carbon Dioxide
5%
Plasma Temperature
5%
Refractivity
5%
Water Vapor
5%
Engineering
Atomic Layer Deposition
100%
Low-Temperature
100%
Aluminum Oxide
100%
Exposure Time
23%
Film Property
23%
Barrier Property
17%
Applications
11%
Cycles
11%
Temperature
11%
Plasma Treatment
11%
Thin Films
11%
Growth Rate
11%
Combines
5%
Optimization
5%
Fabrication
5%
Demonstrates
5%
High Quality
5%
Thickness
5%
Reaction Rate
5%
Throughput
5%
Density
5%
Roughness
5%
Water
5%
Ultrathin Film
5%
Transmissions
5%
Deposition Process
5%
Deeper Understanding
5%
Process Development
5%
Cycle Time
5%
Refractive Index
5%
High Growth Rate
5%
Combined Process
5%
Material Science
Temperature
100%
Silicon Dioxide
100%
Aluminum Oxide
100%
Al2O3
35%
Growth Rate
17%
Thin Films
11%
Density
11%
Film Growth
11%
Thin Film Deposition
11%
Material
5%
Impurity
5%
Refractive Index
5%
Agent
5%
Water Vapor
5%
Film Deposition
5%
Materials Application
5%
Polymer
5%
Ultrathin Films
5%