Low-T anneal as cure for LeTID in Mc-Si PERC cells

Marko Yli-Koski; Toni P. Pasanen; Ismo Heikkinen; Michael Serué; Hele Savin

doi:10.1063/1.5123900

Low-T anneal as cure for LeTID in Mc-Si PERC cells

Marko Yli-Koski, Toni P. Pasanen, Ismo Heikkinen, Michael Serué, Hele Savin

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Abstract

Light and elevated temperature induced degradation (LeTID) is known to be affected by the last dark anneal that the silicon wafers or cells experience prior to illumination. Here we study how low-temperature dark anneal performed on
fully processed multicrystalline silicon (mc-Si) passivated emitter and rear solar cells (PERC) influences LeTID characteristics, both the intensity of the degradation and the degradation kinetics. Our results show that a relatively long
anneal at 300 °C provides an efficient means to minimize LeTI D while too short dark anneal at the same temperature seems to have a negative impact on the subsequent degradation under light soaking. Finally, we compare the experimental results with the model originally developed for metal precipitation
and discuss the possibility of metals being involved in LeTID mechanism.

Original language	English
Article number	140013
Journal	AIP CONFERENCE PROCEEDINGS
Volume	2147
Issue number	1
DOIs	https://doi.org/10.1063/1.5123900
Publication status	Published - 27 Aug 2019
MoE publication type	A4 Article in a conference publication
Event	International Conference on Crystalline Silicon Photovoltaics - Leuven, Belgium Duration: 8 Apr 2019 → 10 Apr 2019 Conference number: 9 https://www.siliconpv.com/home/

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Riddle of light induced degradation in silicon photovoltaics
Savin, H., Yli-Koski, M., Vahlman, H., Inglese, A., Rauha, I., Laine, H., Modanese, C., Nampalli, N., Huang, H., Lindroos, J., von Gastrow, G. & Vähänissi, V.
01/12/2012 → 31/12/2017
Project: EU: ERC grants

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@article{87ae6cf46bc3497181b991c0615d5d08,

title = "Low-T anneal as cure for LeTID in Mc-Si PERC cells",

abstract = "Light and elevated temperature induced degradation (LeTID) is known to be affected by the last dark anneal that the silicon wafers or cells experience prior to illumination. Here we study how low-temperature dark anneal performed on fully processed multicrystalline silicon (mc-Si) passivated emitter and rear solar cells (PERC) influences LeTID characteristics, both the intensity of the degradation and the degradation kinetics. Our results show that a relatively long anneal at 300 °C provides an efficient means to minimize LeTI D while too short dark anneal at the same temperature seems to have a negative impact on the subsequent degradation under light soaking. Finally, we compare the experimental results with the model originally developed for metal precipitation and discuss the possibility of metals being involved in LeTID mechanism. ",

author = "Marko Yli-Koski and Pasanen, {Toni P.} and Ismo Heikkinen and Michael Seru{\'e} and Hele Savin",

note = "| openaire: EC/FP7/307315/EU//SOLARX; International Conference on Crystalline Silicon Photovoltaics, SiliconPV ; Conference date: 08-04-2019 Through 10-04-2019",

year = "2019",

month = aug,

day = "27",

doi = "10.1063/1.5123900",

language = "English",

volume = "2147",

journal = "AIP CONFERENCE PROCEEDINGS",

issn = "0094-243X",

publisher = "American Institute of Physics",

number = "1",

url = "https://www.siliconpv.com/home/",

}

TY - JOUR

T1 - Low-T anneal as cure for LeTID in Mc-Si PERC cells

AU - Yli-Koski, Marko

AU - Pasanen, Toni P.

AU - Heikkinen, Ismo

AU - Serué, Michael

AU - Savin, Hele

N1 - Conference code: 9

PY - 2019/8/27

Y1 - 2019/8/27

N2 - Light and elevated temperature induced degradation (LeTID) is known to be affected by the last dark anneal that the silicon wafers or cells experience prior to illumination. Here we study how low-temperature dark anneal performed on fully processed multicrystalline silicon (mc-Si) passivated emitter and rear solar cells (PERC) influences LeTID characteristics, both the intensity of the degradation and the degradation kinetics. Our results show that a relatively long anneal at 300 °C provides an efficient means to minimize LeTI D while too short dark anneal at the same temperature seems to have a negative impact on the subsequent degradation under light soaking. Finally, we compare the experimental results with the model originally developed for metal precipitation and discuss the possibility of metals being involved in LeTID mechanism.

AB - Light and elevated temperature induced degradation (LeTID) is known to be affected by the last dark anneal that the silicon wafers or cells experience prior to illumination. Here we study how low-temperature dark anneal performed on fully processed multicrystalline silicon (mc-Si) passivated emitter and rear solar cells (PERC) influences LeTID characteristics, both the intensity of the degradation and the degradation kinetics. Our results show that a relatively long anneal at 300 °C provides an efficient means to minimize LeTI D while too short dark anneal at the same temperature seems to have a negative impact on the subsequent degradation under light soaking. Finally, we compare the experimental results with the model originally developed for metal precipitation and discuss the possibility of metals being involved in LeTID mechanism.

U2 - 10.1063/1.5123900

DO - 10.1063/1.5123900

M3 - Conference article

VL - 2147

JO - AIP CONFERENCE PROCEEDINGS

JF - AIP CONFERENCE PROCEEDINGS

SN - 0094-243X

IS - 1

M1 - 140013

T2 - International Conference on Crystalline Silicon Photovoltaics

Y2 - 8 April 2019 through 10 April 2019

ER -

Low-T anneal as cure for LeTID in Mc-Si PERC cells

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