Abstract
Deformation of HfN thin films deposited by the reactive sputtering method on silicon and alumina substrates has been investigated using depth-sensing indentation. The experiments performed in a low load range (2-50 mN) revealed that even extremely shallow indentations were affected by the elastic/plastic response of the substrate. The analysis of the shape of the indentation load-depth hysteresis loops and of conventional hardness data was supplemented by considerations based on the recently proposed energy principle of indentation.
Original language | English |
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Pages (from-to) | 64-69 |
Number of pages | 6 |
Journal | Journal of Materials Research |
Volume | 12 |
Issue number | 1 |
DOIs | |
Publication status | Published - 1997 |
MoE publication type | A1 Journal article-refereed |
Keywords
- SURFACE DEFORMATION
- HARDNESS MEASUREMENTS
- ENERGY PRINCIPLE
- HAFNIUM NITRIDE
- COATINGS
- SILICON
- SAPPHIRE
- TIN