Localized gallium doping and cryogenic deep reactive ion etching in fabrication of silicon nanostructures

Nikolai Chekurov, Kestutis Grigoras, Antti Peltonen, Sami Franssila, Ilkka Tittonen

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

Original languageEnglish
Title of host publicationMRS Spring Meeting 2009, April, San Francisco, USA
Pages21-26
DOIs
Publication statusPublished - 2009
MoE publication typeA4 Article in a conference publication

Publication series

NameMaterials Research Society Symposium Proceedings
Volume1181
ISSN (Print)0272-9172

Keywords

  • deep reactive ion etching
  • focuse ion beam
  • nanofabrication

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