Fabrication of nanostructured metasurfaces poses a significant technological and fundamental challenge. Despite developing novel material systems that support reversible elongation and distortion, their nanoscale patterning and control of optical properties remain an open problem. Herein we report the atomic force microscope lithography application for nanoscale patterning of single-walled carbon nanotube films and the associated optical reflection coefficient tuning. Large scale mesoscopic distinct element method atomic force nanoindentation simulations of single-walled carbon nanotube samples comprising entangled dendritic nanotube bundles with branches extending down to individual tubes explain the mesoscale mechanism of local irreversible densification and further predict its impact on mechanical properties. All observed and calculated phenomena support each other and present a platform for developing patterned optical devices using nanofibrous matter.
- AFM lithography
- SWCNT films