Linewidth uniformity and etch rate uniformity in refractory metal plasma etching

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	English
Journal	Journal of Vacuum Science and Technology
Volume	B12
Issue number	5
Publication status	Published - 1994
MoE publication type	A1 Journal article-refereed

Keywords

@article{c823d0ba4e1c40428da5a249893a0e58,

title = "Linewidth uniformity and etch rate uniformity in refractory metal plasma etching",

keywords = "etch, uniformity, etch, uniformity, etch, uniformity",

author = "Sami Franssila",

year = "1994",

language = "English",

volume = "B12",

journal = "Journal of Vacuum Science and Technology",

issn = "2331-1754",

publisher = "American Institute of Physics",

number = "5",

}