Learnings from an open science effort: Virtual project on the history of ALD

R. L. Puurunen*

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

1 Citation (Scopus)

Abstract

This work summarizes learnings from an Open Science effort "Virtual project on the History of ALD" (VPHA), started in 2013 to clarify the early history of atomic layer deposition (ALD). ALD is a multi-tool of nanotechnology and has been e.g. enabler of the continuation of Moore's law of transistor scaling. ALD has been developed historically through two independent routes: atomic layer epitaxy (ALE) and molecular layering (ML). Especially the details on ML have remained little known to a broader audience. In this contribution, learnings in VPHA are seen from the viewpoint of its voluntary coordinator (the author self) related to historical details of ALD as well as from an organizational viewpoint and some other viewpoints. Selected details related to ALD's history not fully accurately described in three earlier review articles are pointed out. The work made in VPHA has resulted in journal articles, presentations and an exhibition, and VPHA has in part provided the foundation for granting the 2018 Millennium Technology Prize to Dr. Tuomo Suntola. At the time of writing this contribution, in July 2018, VPHA is still on-going, and more volunteers are welcome to join the effort.

Original languageEnglish
Title of host publicationATOMIC LAYER DEPOSITION APPLICATIONS
EditorsStefan De Gendt, Jeffrey W. Elam, Jolien Dendooven, Oscar Van Der Straten, Fred Roozeboom, Chanyuan Liu, Andrea Illiberi
PublisherElectrochemical Society, Inc.
Pages3-17
Number of pages15
Volume14
ISBN (Electronic)978-1-60768-852-5
DOIs
Publication statusPublished - 1 Jan 2018
MoE publication typeA4 Article in a conference publication
EventSymposium on Atomic Layer Deposition Applications - Cancun, Mexico
Duration: 30 Sep 20184 Oct 2018
Conference number: 14

Publication series

NameECS Transactions
PublisherElectrochemical Society, Inc.
Number6
Volume86
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Conference

ConferenceSymposium on Atomic Layer Deposition Applications
CountryMexico
CityCancun
Period30/09/201804/10/2018
OtherAiMES, ECS and SMEQ Joint International Meeting

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