Laterally proximized aluminum tunnel junctions

J.V. Koski, J.T. Peltonen, M. Meschke, J.P. Pekola

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Abstract

This letter presents experiments on junctions fabricated by a technique that enables the use of high-quality aluminum oxide tunnel barriers with normal metal electrodes at low temperatures. Inverse proximity effect is applied to diminish the superconductivity of an aluminum dot through a clean lateral connection to a normal metal electrode. To demonstrate the effectiveness of this method, fully normal-state single electron transistors (SETs) and normal metal-insulator-superconductor (NIS) junctions applying proximized Al junctions were fabricated. The transport characteristics of the junctions were similar to those obtained from standard theoretical models of regular SETs and NIS junctions.
Original languageEnglish
Article number203501
Pages (from-to)1-3
Number of pages3
JournalApplied Physics Letters
Volume98
Issue number20
DOIs
Publication statusPublished - 2011
MoE publication typeA1 Journal article-refereed

Keywords

  • tunnel junctions

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