Large-area highly crystalline WSe2 atomic layers for ultrafast pulsed lasers

Research output: Contribution to journalArticleScientificpeer-review

Details

Original languageEnglish
Pages (from-to)30020-30031
Number of pages12
JournalOptics Express
Volume25
Issue number24
Publication statusPublished - 27 Nov 2017
MoE publication typeA1 Journal article-refereed

Researchers

  • Y. I.N. Jinde
  • L. I. Jiarong
  • Hao Chen
  • Jintao Wang
  • Y. A.N. Peiguang
  • L. I.U. Mengli
  • L. I.U. Wenjun
  • L. U. Wei
  • X. U. Zihan
  • Wenfei Zhang
  • Jinzhang Wang
  • Zhipei Sun

  • Shuangchen Ruan

Research units

  • Shenzhen University
  • Beijing University of Posts and Telecommunications
  • Hong Kong Polytechnic University
  • Shenzen 6Carbon Technology

Abstract

Large-area and highly crystalline transition metal dichalcogenides (TMDs) films possess superior saturable absorption compared to the TMDs nanosheet counterparts, which make them more suitable as excellent saturable absorbers (SA) for ultrafast laser technology. Thus far, the nonlinear optical properties of large-scale WSe2 and its applications in ultrafast photonics have not yet been fully investigated. In this work, the saturable absorption of chemical vapor deposition (CVD) grown WSe2 films with large-scale and high quality are studied and the use of WSe2 films as a broadband SA for passively mode-locked fiber lasers at both 1.5 and 2 μm ranges is demonstrated. To enhance the light-material interaction, large-area WSe2 film is tightly transferred onto the side wall of a microfiber to form a hybrid structure, which realizes strong evanescent wave interaction between light and WSe2 film. The integrated microfiber-WSe2 device shows a large modulation depth of 54.5%. Using the large-area WSe2 as a mode-locker, stable soliton mode-locked pulse generation is achieved and the pulse durations of 477 fs (at 1.5 μm) and 1.18 ps (at 2.0 μm) are demonstrated, which suggests that the large-area and highly crystalline WSe2 films afford an excellent broadband SA for ultrafast photonic applications.

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