Large-area thermoelectric high-aspect-ratio nanostructures by atomic layer deposition

Mikko Ruoho, Taneli Juntunen, Ilkka Tittonen

Research output: Contribution to journalArticleScientificpeer-review

19 Citations (Scopus)

Abstract

We report on the thermoelectric properties of large-area high-aspect-ratio nanostructures. We fabricate the structures by atomic layer deposition of conformal ZnO thin films on track-etched polycarbonate substrate. The resulting structure consists of ZnO tubules which continue through the full thickness of the substrate. The electrical and thermal properties of the structures are studied both in-plane and out-of-plane. They exhibit very low out-of-plane thermal conductivity down to 0.15 W m-1 K-1 while the in-plane sheet resistance of the films was found to be half that of the same film on glass substrate, allowing material-independent doubling of output power of any planar thin-film thermoelectric generator. The wall thickness of the fabricated nanotubes was varied within a range of up to 100 nm. The samples show polycrystalline nature with (002) preferred crystal orientation.

Original languageEnglish
Article number355403
Number of pages10
JournalNanotechnology
Volume27
Issue number35
DOIs
Publication statusPublished - 25 Jul 2016
MoE publication typeA1 Journal article-refereed

Keywords

  • atomic layer deposition
  • large-area
  • nanocomposite
  • nanofabrication
  • thermoelectrics
  • thin film
  • ZnO

Fingerprint

Dive into the research topics of 'Large-area thermoelectric high-aspect-ratio nanostructures by atomic layer deposition'. Together they form a unique fingerprint.

Cite this