Lanthanum doped hafnium oxide thin films deposited on a lateral high aspect ratio structure using atomic layer deposition: A comparative study of surface composition and uniformity using x-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectrometry

Jennifer Emara*, Alireza M. Kia, Sascha Bönhardt, Clemens Mart, Kati Kühnel, Nora Haufe, Riikka L. Puurunen, Mikko Utriainen, Wenke Weinreich

*Corresponding author for this work

Research output: Contribution to journal › Article › Scientific › peer-review

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