Island growth in the atomic layer deposition of zirconium oxide and aluminum oxide on hydrogen-terminated silicon: Growth mode modeling and transmission electron microscopy
- Riikka L. Puurunen*
- , Wilfried Vandervorst
- , Wim F A Besling
- , Olivier Richard
- , Hugo Bender
- , Thierry Conard
- , Chao Zhao
- , Annelies Delabie
- , Matty Caymax
- , Stefan De Gendt
- , Marc Heyns
- , Minna M. Viitanen
- , Marco De Ridder
- , Hidde H. Brongersma
- , Yde Tamminga
- , Thuy Dao
- , Toon De Win
- , Marcel Verheijen
- , Monja Kaiser
- , Marko Tuominen
*Corresponding author for this work
Research output: Contribution to journal › Article › Scientific › peer-review
154
Citations
(Scopus)