Island growth as a growth mode in atomic layer deposition: A phenomenological model

Riikka L. Puurunen*, Wilfried Vandervorst

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

233 Citations (Scopus)

Abstract

A division of atomic layer deposition (ALD) processes to four classes was proposed, on the basis of how the growth-per-cycle (GPC) varied with the number of ALD reaction cycles. Island growth was identified as a likely origin for type 2 substrate-inhibited growth. A simple phenomenological model was developed to describe island growth in ALD. The benefits and limitations of the model and the general characteristics of type 2 substrate-inhibited ALD were discussed.

Original languageEnglish
Article number10
Pages (from-to)7686-7695
Number of pages10
JournalJournal of Applied Physics
Volume96
Issue number12
DOIs
Publication statusPublished - 15 Dec 2004
MoE publication typeA1 Journal article-refereed

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