Investigation of sub-nm ALD aluminum oxide films by plasma assisted etch-through

K. Grigoras, S. Franssila, V-M. Airaksinen

Research output: Contribution to journal › Article › Scientific › peer-review

Keywords

@article{a8c53fa13d91420d9eb6bc69b252a861,

title = "Investigation of sub-nm ALD aluminum oxide films by plasma assisted etch-through",

keywords = "alumina, RIE, thin films, alumina, RIE, thin films, alumina, RIE, thin films",

author = "K. Grigoras and S. Franssila and V-M. Airaksinen",

year = "2008",

language = "English",

volume = "516",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier Science",

}

TY - JOUR

T1 - Investigation of sub-nm ALD aluminum oxide films by plasma assisted etch-through

AU - Grigoras, K.

AU - Franssila, S.

AU - Airaksinen, V-M.

PY - 2008

Y1 - 2008

KW - alumina

KW - RIE

KW - thin films

KW - alumina

KW - RIE

KW - thin films

KW - alumina

KW - RIE

KW - thin films

M3 - Article

VL - 516

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

ER -