Investigation of sub-nm ALD aluminum oxide films by plasma assisted etch-through

K. Grigoras, S. Franssila, V-M. Airaksinen

    Research output: Contribution to journalArticleScientificpeer-review

    Original languageEnglish
    JournalThin Solid Films
    Volume516
    Publication statusPublished - 2008
    MoE publication typeA1 Journal article-refereed

    Keywords

    • alumina
    • RIE
    • thin films

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