Interlayer Exciton Lasing in Atomically Thin Heterostructures

Qiaoling Lin, Hanlin Fang, Yuanda Liu, Yi Zhang, Moritz Fischer, Juntao Li, Nicolas Stenger, Zhipei Sun, Martijn Wubs, Sanshui Xiao*

*Corresponding author for this work

Research output: Contribution to conferencePaperScientificpeer-review

Abstract

We present an interlayer exciton laser composed of a MoS2/WSe2 heterostructure integrated with a silicon photonic topological microcavity with a quality factor of up to 104. We achieve excitonic lasing with ultra-low threshold, high side-mode suppression ratio and the longest emission wavelength to the telecommunication O-band.

Original languageEnglish
Pages1691
Number of pages1
Publication statusPublished - 2023
MoE publication typeNot Eligible
EventInternational Conference on Metamaterials, Photonic Crystals and Plasmonics - Paris, France
Duration: 18 Jul 202321 Jul 2023
Conference number: 13

Conference

ConferenceInternational Conference on Metamaterials, Photonic Crystals and Plasmonics
Abbreviated titleMETA
Country/TerritoryFrance
CityParis
Period18/07/202321/07/2023

Fingerprint

Dive into the research topics of 'Interlayer Exciton Lasing in Atomically Thin Heterostructures'. Together they form a unique fingerprint.

Cite this