Interfacial Reactions in the Ti/Si3N4 and TiN/Si Diffusion Couples

M. Paulasto, F.J.J. van Loo, J.K. Kivilahti

    Research output: Contribution to journalArticleScientificpeer-review

    34 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)4412-4416
    JournalJournal of Applied Physics
    Volume77
    Issue numberMay
    Publication statusPublished - 1995
    MoE publication typeA1 Journal article-refereed

    Keywords

    • diffusion couples
    • silicon nitride
    • titanium

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