Interfacial mechanical testing of atomic layer deposited TiO2 and Al2O3 on silicon substrate by the use of embedded SiO2 microspheres

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Original languageEnglish
Pages (from-to)37320-37328
Number of pages9
JournalRSC Advances
Volume4
Issue number70
Publication statusPublished - 2014
MoE publication typeA1 Journal article-refereed

    Research areas

  • adhesion, Al2O3, atomic layer deposition (ALD), cohesion, embedded microspheres, interfacial fracture, interfacial mechanical testing, interfacial strength, TiO2

ID: 709211