Integration of atomic layer deposited nanolaminates on silicon waveguides (Conference Presentation)

Anton Autere*, Lasse Karvonen, Antti Säynätjoki, Matthieu Roussey, John Rönn, Elina Färm, Marianna Kemell, Xiaoguang Tu, Tsung-Yang Liow, Patrick Lo, Mikko Ritala, Markku Leskelä, Harri Lipsanen, Seppo Honkanen, Zhipei Sun

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

Original languageEnglish
Title of host publicationSILICON PHOTONICS AND PHOTONIC INTEGRATED CIRCUITS V
EditorsL Vivien, L Pavesi, S Pelli
PublisherSPIE - The International Society for Optical Engineering
Number of pages2
ISBN (Print)9781510601369
DOIs
Publication statusPublished - 2016
MoE publication typeA4 Article in a conference publication
EventSPIE Photonics Europe - Brussels, Belgium
Duration: 3 Apr 20167 Apr 2016

Publication series

NameProceedings of SPIE
PublisherSPIE-INT SOC OPTICAL ENGINEERING
Volume9891
ISSN (Print)0277-786X

Conference

ConferenceSPIE Photonics Europe
CountryBelgium
CityBrussels
Period03/04/201607/04/2016

Cite this

Autere, A., Karvonen, L., Säynätjoki, A., Roussey, M., Rönn, J., Färm, E., Kemell, M., Tu, X., Liow, T-Y., Lo, P., Ritala, M., Leskelä, M., Lipsanen, H., Honkanen, S., & Sun, Z. (2016). Integration of atomic layer deposited nanolaminates on silicon waveguides (Conference Presentation). In L. Vivien, L. Pavesi, & S. Pelli (Eds.), SILICON PHOTONICS AND PHOTONIC INTEGRATED CIRCUITS V [UNSP 98910J] (Proceedings of SPIE; Vol. 9891). SPIE - The International Society for Optical Engineering. https://doi.org/10.1117/12.2227097