TY - JOUR
T1 - Influence of the deposition angle on the magnetic anisotropy in thin Co films on Cu(001)
AU - van Dijken, Sebastiaan
AU - Di Santo, Giovanni
AU - Poelsema, Bene
PY - 2001/2
Y1 - 2001/2
N2 - Off-normal molecular beam epitaxy of Co on Cu(001) has been found to result in a uniaxial magnetic anisotropy. The easy magnetization axis is perpendicular to the plane of incidence for deposition angles between 10° and 80°. The uniaxial magnetic anisotropy is related to the formation of a uniaxial surface morphology during off-normal growth. Spot profile analysis low-energy electron diffraction measurements reveal the presence of elongated adatom structures in contrast to square ones growing at normal incidence. The long sides of the adatom structures are oriented perpendicular to the plane of incidence, i.e., parallel to the easy magnetization axis. The formation of elongated adatom structures is due to steering. Steering originates from long-range attractive forces between incident atoms and substrate atoms and leads to preferential arrival of atoms on top of adatom structures.
AB - Off-normal molecular beam epitaxy of Co on Cu(001) has been found to result in a uniaxial magnetic anisotropy. The easy magnetization axis is perpendicular to the plane of incidence for deposition angles between 10° and 80°. The uniaxial magnetic anisotropy is related to the formation of a uniaxial surface morphology during off-normal growth. Spot profile analysis low-energy electron diffraction measurements reveal the presence of elongated adatom structures in contrast to square ones growing at normal incidence. The long sides of the adatom structures are oriented perpendicular to the plane of incidence, i.e., parallel to the easy magnetization axis. The formation of elongated adatom structures is due to steering. Steering originates from long-range attractive forces between incident atoms and substrate atoms and leads to preferential arrival of atoms on top of adatom structures.
UR - http://www.scopus.com/inward/record.url?scp=0034896165&partnerID=8YFLogxK
U2 - 10.1103/PhysRevB.63.104431
DO - 10.1103/PhysRevB.63.104431
M3 - Article
AN - SCOPUS:0034896165
VL - 63
JO - Physical Review B (Condensed Matter and Materials Physics)
JF - Physical Review B (Condensed Matter and Materials Physics)
SN - 2469-9950
IS - 10
M1 - 104431
ER -