Influence of silicon doping on vacancies and optical properties of Al(x)Ga(1-x)N thin films

Jonatan Slotte, Filip Tuomisto, K. Saarinen, C.G. Moe, Stacia Keller, S.P. DenBaars

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19 Citations (Scopus)
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Abstract

The authors have used positron annihilation spectroscopy and photoluminescence measurements to study the influence of silicon doping on vacancy formation in AlGaN:Si structures. The results show a correlation between the Doppler broadening measurements and the intensity from 510nm photoluminescence transition. The reduction in the W parameter when the [Si]∕[Al+Ga] fraction in the gas phase is above 3×10−4 indicates that the positrons annihilate in an environment where less Ga 3d electrons are present, i.e., they are trapped in group-III vacancies. The observation of vacancies at these silicon concentrations coincides with the onset of the photoluminescence transition at 510nm.
Original languageEnglish
Article number151908
Pages (from-to)1-3
Number of pages3
JournalApplied Physics Letters
Volume90
Issue number15
DOIs
Publication statusPublished - 2007
MoE publication typeA1 Journal article-refereed

Keywords

  • AlGaN
  • optical properties
  • photoluminescence
  • positron annihilation
  • vacancies

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