Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition

Research output: Contribution to journalArticleScientificpeer-review

Researchers

Research units

  • Tampere University of Technology
  • University of Jyväskylä

Details

Original languageEnglish
Article number505502
Pages (from-to)1-8
Number of pages8
JournalJournal of Physics D: Applied Physics
Volume46
Issue number50
Publication statusPublished - 2013
MoE publication typeA1 Journal article-refereed

ID: 809636