Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition

Alexander Pyymaki Perros, Hanna Hakola, Timo Sajavaara, Teppo Huhtio, Harri Lipsanen

Research output: Contribution to journalArticleScientificpeer-review

26 Citations (Scopus)
Original languageEnglish
Article number505502
Pages (from-to)1-8
Number of pages8
JournalJournal of Physics D: Applied Physics
Issue number50
Publication statusPublished - 2013
MoE publication typeA1 Journal article-refereed

Cite this