Influence of InGaN interlayer thickness on GaN layers grown by metal organic chemical vapour deposition

Research output: Contribution to journalArticleScientificpeer-review

Researchers

  • K. Prabakaran
  • M. Jayasakthi
  • S. Surender
  • S. Pradeep
  • S. Sanjay
  • Ramesh Raju

  • M. Balaji
  • K. Baskar

Research units

  • Anna University
  • University of Madras
  • Manonmaniam Sundaranar University

Abstract

InGaN interlayer was grown between GaN layers on sapphire substrate using metal organic chemical vapour deposition. The crystalline quality of the sample was investigated using high-resolution X-ray diffraction. The indium composition and InGaN thickness were determined to be 10–15% and 5–10 nm, respectively. Transmission electron microscopy image revealed the interfacial characteristics of the InGaN and GaN layers. Raman spectroscopy revealed prominent GaN peak positions with InGaN shoulder peaks. The growth mode of InGaN and GaN was determined as nanoislands with helical-like morphology by atomic force microscopy. Hall measurement showcased improvement in the mobility and bulk concentration for the GaN/InGaN (5 nm)/GaN structures.

Details

Original languageEnglish
Article number206
Number of pages7
JournalAPPLIED PHYSICS A-MATERIALS SCIENCE AND PROCESSING
Volume125
Issue number3
Publication statusPublished - 1 Mar 2019
MoE publication typeA1 Journal article-refereed

ID: 32237702