Abstract
The large increase in the p-type conductivity observed when nitrogen is added to GaSb has been studied using positron annihilation spectroscopy and ab initio calculations. Doppler broadening measurements have been conducted on samples of GaNxSb1-x layers grown by molecular beam epitaxy, and the results have been compared with calculated first-principle results corresponding to different defect structures. From the calculated data, binding energies for nitrogen-related defects have also been estimated. Based on the results, the increase in residual hole concentration is explained by an increase in the fraction of negative acceptor-type defects in the material. As the band gap decreases with increasing N concentration, the ionization levels of the defects move closer to the valence band. Ga vacancy-type defects are found to act as positron trapping defects in the material, and the ratio of Ga vacancy-type defects to Ga antisites is found to be higher than that of the p-type bulk GaSb substrate. Beside Ga vacancies, the calculated results imply that complexes of a Ga vacancy and nitrogen could be present in the material. (C) 2015 AIP Publishing LLC.
Original language | English |
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Article number | 085708 |
Pages (from-to) | 1-9 |
Number of pages | 9 |
Journal | Journal of Applied Physics |
Volume | 118 |
Issue number | 8 |
DOIs | |
Publication status | Published - 28 Aug 2015 |
MoE publication type | A1 Journal article-refereed |
Keywords
- POSITRON LIFETIME SPECTROSCOPY
- UNDOPED GALLIUM ANTIMONIDE
- MOLECULAR-BEAM EPITAXY
- AUGMENTED-WAVE METHOD
- BAND-GAP REDUCTION
- GROWN GANAS
- ALLOYS
- PHOTOLUMINESCENCE
- ANNIHILATION
- SEMICONDUCTORS