In situ quadrupole mass spectrometry study of atomic-layer deposition of ZrO2 using Cp2Zr(CH3)2 and water

Jaakko Niinistö, Antti Rahtu, Matti Putkonen, Mikko Ritala, Markku Leskelä, Lauri Niinistö

    Research output: Contribution to journalArticleScientificpeer-review

    42 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)7321-7325
    JournalLangmuir
    Volume21
    Publication statusPublished - 2005
    MoE publication typeA1 Journal article-refereed

    Keywords

    • ALD
    • atomic layer deposition
    • cyclopentadienyl precursors
    • high-k dielectrics
    • QMS
    • reaction mechanism

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