@article{2a0b20eb46c04f139c13ca3361ba0d3d,
title = "In situ quadrupole mass spectrometry study of atomic-layer deposition of ZrO2 using Cp2Zr(CH3)2 and water",
keywords = "ALD, atomic layer deposition, cyclopentadienyl precursors, high-k dielectrics, QMS, reaction mechanism, ALD, atomic layer deposition, cyclopentadienyl precursors, high-k dielectrics, QMS, reaction mechanism, ALD, atomic layer deposition, cyclopentadienyl precursors, high-k dielectrics, QMS, reaction mechanism",
author = "Jaakko Niinist{\"o} and Antti Rahtu and Matti Putkonen and Mikko Ritala and Markku Leskel{\"a} and Lauri Niinist{\"o}",
year = "2005",
language = "English",
volume = "21",
pages = "7321--7325",
journal = "Langmuir",
issn = "0743-7463",
publisher = "AMERICAN CHEMICAL SOCIETY",
}