In Situ Atomic/Molecular Layer-by-Layer Deposition of Inorganic-Organic Coordination Network Thin Films from Gaseous Precursors

Esko Ahvenniemi, Maarit Karppinen*

*Corresponding author for this work

    Research output: Contribution to journalArticleScientificpeer-review

    43 Citations (Scopus)
    190 Downloads (Pure)

    Abstract

    Crystalline inorganic-organic coordination network materials possess a property palette highly attractive for a number of frontier applications. In many prospective applications of these materials, high-quality thin films would be required. Gas-phase thin-film techniques could potentially provide a number of advantages over the current liquid-phase techniques for depositing such state-of-the-art hybrid thin films. The strongly emerging atomic/molecular layer deposition (ALD/MLD) technique in particular enables the rational fabrication of inorganic-organic thin films in a digital atomic/molecular layer-by-layer manner through successive gas-to-surface reactions of inorganic and organic precursors, but the resultant films have been amorphous. Here, we demonstrate the in situ ALD/MLD growth of well-crystalline calcium terephthalate (Ca-TP) coordination network thin films in a wide deposition temperature range. We moreover investigate the water absorption/desorption characteristics of the films and report attractive mechanical properties for both the dry and water-intercalated films.

    Original languageEnglish
    Pages (from-to)6260-6265
    Number of pages6
    JournalChemistry of Materials
    Volume28
    Issue number17
    DOIs
    Publication statusPublished - 13 Sep 2016
    MoE publication typeA1 Journal article-refereed

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