Improved silicon surface passivation with atomic layer deposited Al2O3 for photovoltaic applications

Guillaume von Gastrow, Shuo Li, Yameng Bao, Päivikki Repo, Hele Savin

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientific

Original languageEnglish
Title of host publication25th Nordic Semiconductor Meeting, Espoo, Finland, June 9-12, 2013
Publication statusPublished - 2013
MoE publication typeB3 Non-refereed article in conference proceedings

Cite this

von Gastrow, G., Li, S., Bao, Y., Repo, P., & Savin, H. (2013). Improved silicon surface passivation with atomic layer deposited Al2O3 for photovoltaic applications. In 25th Nordic Semiconductor Meeting, Espoo, Finland, June 9-12, 2013