Hybrid inorganic–organic superlattice structures with atomic layer deposition/molecular layer deposition

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Abstract

A combination of the atomic layer deposition (ALD) and molecular layer deposition (MLD) techniques is successfully employed to fabricate thin films incorporating superlattice structures that consist of single layers of organic molecules between thicker layers of ZnO. Diethyl zinc and water are used as precursors for the deposition of ZnO by ALD, while three different organic precursors are investigated for the MLD part: hydroquinone, 4-aminophenol and 4,4′-oxydianiline. The successful superlattice formation with all the organic precursors is verified through x-ray reflectivity studies. The effects of the interspersed organic layers/superlattice structure on the electrical and thermoelectric properties of ZnO are investigated through resistivity and Seebeck coefficient measurements at room temperature. The results suggest an increase in carrier concentration for small concentrations of organic layers, while higher concentrations seem to lead to rather large reductions in carrier concentration.

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Original languageEnglish
Article number01A105
Pages (from-to)1-5
JournalJOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A
Volume32
Issue number1
Publication statusPublished - 2014
MoE publication typeA1 Journal article-refereed

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