Hybrid inorganic–organic superlattice structures with atomic layer deposition/molecular layer deposition

Tommi Tynell, Hisao Yamauchi, Maarit Karppinen

    Research output: Contribution to journalArticleScientificpeer-review

    24 Citations (Scopus)
    32 Downloads (Pure)


    A combination of the atomic layer deposition (ALD) and molecular layer deposition (MLD) techniques is successfully employed to fabricate thin films incorporating superlattice structures that consist of single layers of organic molecules between thicker layers of ZnO. Diethyl zinc and water are used as precursors for the deposition of ZnO by ALD, while three different organic precursors are investigated for the MLD part: hydroquinone, 4-aminophenol and 4,4′-oxydianiline. The successful superlattice formation with all the organic precursors is verified through x-ray reflectivity studies. The effects of the interspersed organic layers/superlattice structure on the electrical and thermoelectric properties of ZnO are investigated through resistivity and Seebeck coefficient measurements at room temperature. The results suggest an increase in carrier concentration for small concentrations of organic layers, while higher concentrations seem to lead to rather large reductions in carrier concentration.
    Original languageEnglish
    Article number01A105
    Pages (from-to)1-5
    Issue number1
    Publication statusPublished - 2014
    MoE publication typeA1 Journal article-refereed

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