Highly stable and conformal Ti-organic thin films from sustainable precursors via atomic/molecular layer deposition towards green energy applications

Anish Philip, Umaid Lone, Olga Partanen, Eero Haimi, Maarit Karppinen*

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

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Abstract

Thin-film deposition using sustainable precursors is required for various next-generation green energy applications. Here we report two atomic/molecular layer deposition processes for appreciably stable and conformal Ti-organic thin films and TiO2:organic superlattices with potential in e.g. battery, photocatalysis and thermoelectric applications. These processes are based on the safe and sustainable titanium isopropoxide as the titanium precursor.

Original languageEnglish
Pages (from-to)917-920
Number of pages4
JournalChemical Communications
Volume61
Issue number5
Early online date6 Dec 2024
DOIs
Publication statusPublished - 16 Jan 2025
MoE publication typeA1 Journal article-refereed

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