High-permittivity YScO3 thin films by atomic layer deposition using two precursor approaches

Pia Myllymäki, Minna Nieminen, Jaakko Niinistö, Matti Putkonen, Kaupo Kukli, Lauri Niinistö

    Research output: Contribution to journalArticleScientificpeer-review

    30 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)563-569
    JournalJournal of Materials Chemistry
    Volume16
    Issue number6
    Publication statusPublished - 2006
    MoE publication typeA1 Journal article-refereed

    Keywords

    • atomic layer deposition, yttrium scandium oxide, high-k

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