HfO2 Thin Films from Cyclopentadienyl Precursor by Atomic Layer Deposition

Jaakko Niinistö, Matti Putkonen, Lauri Niinistö

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

    Original languageEnglish
    Title of host publication9th International Conference on Electronic Materials, Moscone West and San Francisco Marriott , CA, April 12-16, 2004
    Place of PublicationUSA
    PublisherInternational Union of Materials Research Societies
    Publication statusPublished - 2004
    MoE publication typeA4 Article in a conference publication

    Keywords

    • atomic layer deposition
    • cyclopentadienyl
    • HfO<sub>2</sub>

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