HfO2 Films Grown by ALD using Cyclopentadienyl-Type Precursors and H2O or O3 as Oxygen Source

Research output: Contribution to journalArticleScientificpeer-review


  • Jaakko Niinistö
  • Matti Putkonen
  • Lauri Niinistö
  • Kai Arstila
  • Timo Sajavaara
  • Kaupo Kukli
  • Mikko Ritala
  • Markku Leskelä

Research units


Original languageEnglish
Pages (from-to)F39-F45
JournalJournal of the Electrochemical Society
Issue number3
Publication statusPublished - 2006
MoE publication typeA1 Journal article-refereed

ID: 2409422