HfO2 Films Grown by ALD using Cyclopentadienyl-Type Precursors and H2O or O3 as Oxygen Source

Jaakko Niinistö, Matti Putkonen, Lauri Niinistö, Kai Arstila, Timo Sajavaara, Kaupo Kukli, Mikko Ritala, Markku Leskelä

    Research output: Contribution to journalArticleScientificpeer-review

    34 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)F39-F45
    JournalJournal of the Electrochemical Society
    Volume153
    Issue number3
    Publication statusPublished - 2006
    MoE publication typeA1 Journal article-refereed

    Cite this