He Implantation Induced Nanovoids in Crystalline Si

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He Implantation Induced Nanovoids in Crystalline Si. / Kilpeläinen, Simo; Kuitunen, Kimmo; Slotte, Jonatan; Tuomisto, Filip; Bruno, E.; Mirabella, S.; Priolo, F.

In: JOURNAL OF MATERIALS SCIENCE AND ENGINEERING B, Vol. 159-160, 15.03.2009, p. 164-167.

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Kilpeläinen, Simo ; Kuitunen, Kimmo ; Slotte, Jonatan ; Tuomisto, Filip ; Bruno, E. ; Mirabella, S. ; Priolo, F. / He Implantation Induced Nanovoids in Crystalline Si. In: JOURNAL OF MATERIALS SCIENCE AND ENGINEERING B. 2009 ; Vol. 159-160. pp. 164-167.

Bibtex - Download

@article{73c2b384cec7476db2181417a35f06f3,
title = "He Implantation Induced Nanovoids in Crystalline Si",
keywords = "He implantation, positron, Si, He implantation, positron, Si, He implantation, positron, Si",
author = "Simo Kilpel{\"a}inen and Kimmo Kuitunen and Jonatan Slotte and Filip Tuomisto and E. Bruno and S. Mirabella and F. Priolo",
year = "2009",
month = "3",
day = "15",
doi = "10.1016/j.mseb.2008.12.010",
language = "English",
volume = "159-160",
pages = "164--167",
journal = "JOURNAL OF MATERIALS SCIENCE AND ENGINEERING B",
issn = "2161-6221",

}

RIS - Download

TY - JOUR

T1 - He Implantation Induced Nanovoids in Crystalline Si

AU - Kilpeläinen, Simo

AU - Kuitunen, Kimmo

AU - Slotte, Jonatan

AU - Tuomisto, Filip

AU - Bruno, E.

AU - Mirabella, S.

AU - Priolo, F.

PY - 2009/3/15

Y1 - 2009/3/15

KW - He implantation

KW - positron

KW - Si

KW - He implantation

KW - positron

KW - Si

KW - He implantation

KW - positron

KW - Si

U2 - 10.1016/j.mseb.2008.12.010

DO - 10.1016/j.mseb.2008.12.010

M3 - Article

VL - 159-160

SP - 164

EP - 167

JO - JOURNAL OF MATERIALS SCIENCE AND ENGINEERING B

JF - JOURNAL OF MATERIALS SCIENCE AND ENGINEERING B

SN - 2161-6221

ER -

ID: 3629753