He Implantation Induced Nanovoids in Crystalline Si

Research output: Contribution to journalArticle

Researchers

Research units

  • University of Catania

Details

Original languageEnglish
Pages (from-to)164-167
Number of pages4
JournalJOURNAL OF MATERIALS SCIENCE AND ENGINEERING B
Volume159-160
Publication statusPublished - 15 Mar 2009
MoE publication typeA1 Journal article-refereed

    Research areas

  • He implantation, positron, Si

ID: 3629753