Hardness, elastic modulus, and wear resistance of hafnium oxide-based films grown by atomic layer deposition

Research output: Contribution to journalArticle

Researchers

  • Maria Berdova
  • Xuwen Liu
  • Claudia Wiemer
  • Alessio Lamperti
  • Grazia Tallarida
  • Elena Cianci
  • Marco Fanciulli
  • Sami Franssila

Research units

  • Institute for Microelectronics and Microsystems
  • Dipartimento di Scienza dei Materiali, Universita degli studi di Milano Bicocca

Abstract

The investigation of mechanical properties of atomic layer deposition HfO2 films is important for implementing these layers in microdevices. The mechanical properties of films change as a function of composition and structure, which accordingly vary with deposition temperature and post-annealing. This work describes elastic modulus, hardness, and wear resistance of as-grown and annealed HfO2. From nanoindentation measurements, the elastic modulus and hardness remained relatively stable in the range of 163-165 GPa and 8.3-9.7 GPa as a function of deposition temperature. The annealing of HfO2 caused significant increase in hardness up to 14.4 GPa due to film crystallization and densification. The structural change also caused increase in the elastic modulus up to 197 GPa. Wear resistance did not change as a function of deposition temperature, but improved upon annealing.

Details

Original languageEnglish
Article number051510
JournalJOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A
Volume34
Issue number5
Publication statusPublished - 1 Sep 2016
MoE publication typeA1 Journal article-refereed

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