Growth Per Cycle in Atomic Layer Deposition: Real Application Examples of a Theoretical Model

    Research output: Contribution to journalArticleScientificpeer-review

    79 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)327-332
    JournalChemical Vapor Deposition
    Volume9
    Issue number6
    Publication statusPublished - 2003
    MoE publication typeA1 Journal article-refereed

    Keywords

    • aluminum compounds
    • atomic layer deposition
    • growth mechanisms
    • modeling
    • titanium
    • yttrium oxide

    Cite this