Growth of titanium dioxide thin films by atomic layer epitaxy

M. Ritala, M. Leskelä, E. Nykänen, P. Soininen, L. Niinistö

    Research output: Contribution to journalArticleScientificpeer-review

    273 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)288-295
    JournalThin Solid Films
    Volume225
    Publication statusPublished - 1993
    MoE publication typeA1 Journal article-refereed

    Keywords

    • atomic layer epitaxy (ALE)
    • RBS
    • spectrophotometry
    • thin films
    • titanium dioxide
    • XRD

    Cite this

    Ritala, M., Leskelä, M., Nykänen, E., Soininen, P., & Niinistö, L. (1993). Growth of titanium dioxide thin films by atomic layer epitaxy. Thin Solid Films, 225, 288-295.