@inproceedings{d662bda1b7b8454694d5dd166d0a513f,
title = "Growth of aluminium nitride on porous silica from trimethylaluminium and ammonia precursors by the ALCVD technique",
keywords = "aluminium nitride, atomic layer chemical vapour deposition, catalyst, aluminium nitride, atomic layer chemical vapour deposition, catalyst, aluminium nitride, atomic layer chemical vapour deposition, catalyst",
author = "R.L. Puurunen and S. Haukka and E.I. Iiskola and A.O.I. Krause",
year = "1999",
language = "English",
pages = "1",
booktitle = "ALE/ALENET WORKSHOP on synthesis and analysis of atomic and molecular surface structures, Helsinki, 20.-22.6.1999",
}