Growth of aluminium nitride on porous silica by atomic layer chemical vapour deposition

R.L. Puurunen; A. Root; P. Sarv; S. Haukka; E.I. Iiskola; Marina Lindblad; A.O.I. Krause

Growth of aluminium nitride on porous silica by atomic layer chemical vapour deposition

R.L. Puurunen, A. Root, P. Sarv, S. Haukka, E.I. Iiskola, Marina Lindblad, A.O.I. Krause

Research output: Contribution to journal › Article › Scientific › peer-review

37 Citations (Scopus)

Original language	English
Pages (from-to)	193-202
Journal	Applied Surface Science
Volume	165
Publication status	Published - 2000
MoE publication type	A1 Journal article-refereed

Keywords

ALCVD
aluminium nitride
ammonia
IR
NMR
triethylaluminium

Cite this

@article{0a61330ac5da44299dceee39d31b1507,

title = "Growth of aluminium nitride on porous silica by atomic layer chemical vapour deposition",

keywords = "ALCVD, aluminium nitride, ammonia, IR, NMR, triethylaluminium, ALCVD, aluminium nitride, ammonia, IR, NMR, triethylaluminium, ALCVD, aluminium nitride, ammonia, IR, NMR, triethylaluminium",

author = "R.L. Puurunen and A. Root and P. Sarv and S. Haukka and E.I. Iiskola and Marina Lindblad and A.O.I. Krause",

year = "2000",

language = "English",

volume = "165",

pages = "193--202",

journal = "Applied Surface Science",

issn = "0169-4332",

publisher = "Elsevier",

}

TY - JOUR

T1 - Growth of aluminium nitride on porous silica by atomic layer chemical vapour deposition

AU - Puurunen, R.L.

AU - Root, A.

AU - Sarv, P.

AU - Haukka, S.

AU - Iiskola, E.I.

AU - Lindblad, Marina

AU - Krause, A.O.I.

PY - 2000

Y1 - 2000

KW - ALCVD

KW - aluminium nitride

KW - ammonia

KW - IR

KW - NMR

KW - triethylaluminium

KW - ALCVD

KW - aluminium nitride

KW - ammonia

KW - IR

KW - NMR

KW - triethylaluminium

KW - ALCVD

KW - aluminium nitride

KW - ammonia

KW - IR

KW - NMR

KW - triethylaluminium

M3 - Article

SN - 0169-4332

VL - 165

SP - 193

EP - 202

JO - Applied Surface Science

JF - Applied Surface Science

ER -