Growth of aluminium nitride on porous silica by atomic layer chemical vapour deposition

R.L. Puurunen, A. Root, P. Sarv, S. Haukka, E.I. Iiskola, Marina Lindblad, A.O.I. Krause

    Research output: Contribution to journalArticleScientificpeer-review

    32 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)193-202
    JournalApplied Surface Science
    Volume165
    Publication statusPublished - 2000
    MoE publication typeA1 Journal article-refereed

    Keywords

    • ALCVD
    • aluminium nitride
    • ammonia
    • IR
    • NMR
    • triethylaluminium

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