@techreport{31e581b187bf4d4c80a3e3e8a003f792,
title = "Gas Sensitive SnO\_2 Thin Films by Atomic Layer Epitaxy",
keywords = "ale, atomic layer epitaxy, in situ doping, selectivity, tin dioxide, ale, atomic layer epitaxy, in situ doping, selectivity, tin dioxide, ale, atomic layer epitaxy, in situ doping, selectivity, tin dioxide",
author = "K. Kovacs and M. Utriainen and Cs. Ducs{\"o} and E.B. Varhegyi and M. Adam and L. Niinist{\"o} and F. Reti",
year = "1999",
language = "English",
series = "VIth Nexuspan Workshop Microsystems Technology Activities in Baltic Region, Vilna, Liettua, April 23-24, 1999",
pages = "89--91",
type = "WorkingPaper",
}