Gas Sensitive SnO_2 Thin Films by Atomic Layer Epitaxy

K. Kovacs, M. Utriainen, Cs. Ducsö, E.B. Varhegyi, M. Adam, L. Niinistö, F. Reti

    Research output: Working paperProfessional

    Original languageEnglish
    Pages89-91
    Publication statusPublished - 1999
    MoE publication typeD4 Published development or research report or study

    Publication series

    NameVIth Nexuspan Workshop Microsystems Technology Activities in Baltic Region, Vilna, Liettua, April 23-24, 1999

    Keywords

    • ale
    • atomic layer epitaxy
    • in situ doping
    • selectivity
    • tin dioxide

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