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GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride

  • M. Bosund
  • , P. Mattila
  • , A. Aierken
  • , T. Hakkarainen
  • , H. Koskenvaara
  • , M. Sopanen
  • , V.M. Airaksinen

Research output: Contribution to journal › Article › Scientific › peer-review

51 Citations (Scopus)
Original languageEnglish
Pages (from-to)7434-7437
Number of pages4
JournalApplied Surface Science
Volume256
Issue number24
DOIs
Publication statusPublished - 1 Oct 2010
MoE publication typeA1 Journal article-refereed

Keywords

  • atomic layer deposition
  • gallium arsenide
  • photoluminescence
  • surface passivation
  • titanium nitride

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